This work describes the architecture and transistorlevel design of CMOS front-end amplifiers for the readout of large area SiPMs at LAr temperature (87K). Two circuit topologies, based on trans-impedance and common-gate input stages, are discussed and compared. Both circuits were designed using a standard CMOS 110nm technology, and the simulation results obtained with the foundry PDK are presented. The circuits use a power rail of +1.25 V and -1.25 V, and a power budget below 100 mW, for a total gain of 58 dB. The target sensor is a 24cm2 SiPM tile developed in the framework of the Darkside Collaboration. Post-layout simulations with a cryogenic SiPM electrical model indicate that a signal-to-noise ratio above 8 and a jitter better than 15 ns should be achieved for a single photoelectron

Front-End Integrated Circuits For Readout of Large Area SiPMs at cryogenic temperature / MARTINEZ ROJAS, ALEJANDRO DAVID. - (2019). (Intervento presentato al convegno 2019 8th International Conference on Modern Circuits and Systems Technologies (MOCAST) tenutosi a Thessaloniki (Greece) nel 13 May 2019 through 15 May 2019) [10.1109/MOCAST.2019.8741716].

Front-End Integrated Circuits For Readout of Large Area SiPMs at cryogenic temperature

ALEJANDRO DAVID MARTINEZ ROJAS
2019

Abstract

This work describes the architecture and transistorlevel design of CMOS front-end amplifiers for the readout of large area SiPMs at LAr temperature (87K). Two circuit topologies, based on trans-impedance and common-gate input stages, are discussed and compared. Both circuits were designed using a standard CMOS 110nm technology, and the simulation results obtained with the foundry PDK are presented. The circuits use a power rail of +1.25 V and -1.25 V, and a power budget below 100 mW, for a total gain of 58 dB. The target sensor is a 24cm2 SiPM tile developed in the framework of the Darkside Collaboration. Post-layout simulations with a cryogenic SiPM electrical model indicate that a signal-to-noise ratio above 8 and a jitter better than 15 ns should be achieved for a single photoelectron
2019
978-1-7281-1184-1
File in questo prodotto:
File Dimensione Formato  
MOCAST_0419.pdf

accesso aperto

Tipologia: 2. Post-print / Author's Accepted Manuscript
Licenza: PUBBLICO - Tutti i diritti riservati
Dimensione 3.09 MB
Formato Adobe PDF
3.09 MB Adobe PDF Visualizza/Apri
08741716.pdf

non disponibili

Tipologia: 2a Post-print versione editoriale / Version of Record
Licenza: Non Pubblico - Accesso privato/ristretto
Dimensione 3.12 MB
Formato Adobe PDF
3.12 MB Adobe PDF   Visualizza/Apri   Richiedi una copia
Pubblicazioni consigliate

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11583/2751059