The long term goal of the CERN Experimental Physics Department R&D on monolithic sensors is the development of sub-100nm CMOS sensors for high energy physics. The first technology selected is the TPSCo 65nm CMOS imaging technology. A first submission MLR1 included several small test chips with sensor and circuit prototypes and transistor test structures. One of the main questions to be addressed was how to optimize the sensor in the presence of significant in-pixel circuitry. In this paper this optimization is described as well as the experimental results from the MLR1 run confirming its effectiveness. A second submission investigating wafer-scale stitching has just been completed. This work has been carried out in strong synergy with the ITS3 upgrade of the ALICE experiment.
Optimization of a 65 nm CMOS imaging process for monolithic CMOS sensors for high energy physics / Snoeys, Walter; Aglieri Rinella, Gianluca; Andronic, Anton; Antonelli, Matias; Baccomi, Roberto; Ballabriga Sune, Rafael; Barbero, Marlon; Barrillon, Pierre; Baudot, Jerome; Becht, Pascal; Benotto, Franco; Beolé, Stefania; Bertolone, Gregory; Besson, Auguste; Bialas, Wojciech; Borghello, Giulio; Braach, Justus; Buckland, Matthew Daniel; Bugiel, Szymon; Buschmann, Eric; Camerini, Paolo; Campbell, Michael; Carnesecchi, Francesca; Cecconi, Leonardo; Charbon, Edoardo; Chauhan, Ankur; Colledani, Claude; Contin, Giacomo; Dannheim, Dominik; Dort, Katharina; de Melo, João Pacheco; Deng, Wenjing; De Robertis, Giuseppe; Di Mauro, Antonio; Dorda Martin, Ana; Dorokhov, Andrei; Dorosz, Piotr; Eberwein, Gregor; El Bitar, Ziad; Fang, Xiaochao; Fenigstein, Amos; Ferrero, Chiara; Fougeron, Denis; Gajanana, Deepak; Goffe, Mathieu; Gonella, Laura; Grelli, Alessandro; Gromov, Vladimir; Habib, Alexandre; Haim, Adi; Hansen, Karsten; Hasenbichler, Jan; Hillemanns, Hartmut; Hong, Geun Hee; Hu, Christine; Isakov, Artem; Jaaskelainen, Kimmo; Junique, Antoine; Kotliarov, Artem; Kremastiotis, Iraklis; Krizek, Filip; Kluge, Alexander; Kluit, Ruud; Kucharska, Gabriela; Kugathasan, Thanushan; Kwon, Youngil; La Rocca, Paola; Lautner, Lukas; Leitao, Pedro Vicente; Lim, Bong-Hwi; Loddo, Flavio; Mager, Magnus; Marras, Davide; Martinengo, Paolo; Masciocchi, Silvia; Mathew, Soniya; Menzel, Marius Wilm; Morel, Frederic; Mulyanto, Budi; Münker, Magdalena; Musa, Luciano; Nakamura, Masayuki; Pangaud, Patrick; Perciballi, Stefania; Pham, Hung; Piro, Francesco; Prino, Francesco; Rachevski, Sasha; Rebane, Karolina; Reckleben, Christian; Reidt, Felix; Ricci, Riccardo; Russo, Roberto; Sanna, Isabella; Sarritzu, Valerio; Savino, Umberto; Schledewitz, David; Sedgwick, Iain; Soltveit, Hans Kristian; Senyukov, Serhiy; Sonneveld, Jory; Soudier, Jean; Stachel, Johanna; Suzuki, Masakatsu; Svihra, Peter; Suljic, Miljenko; Takahashi, Nobuyoshi; Termo, Gennaro; Tiltmann, Nicolas; Toledano, Elie; Triffiro, Antonio; Turcato, Andrea; Usai, Gianluca; Valin, Isabella; Villani, Anna; Van Beelen, Jacob Bastiaan; Vassilev, Mirella Dimitrova; Vernieri, Caterina; Vitkovskiy, Arseniy; Wu, Yitao; Yelkenci, Asli; Yuncu, Alperen. - In: POS PROCEEDINGS OF SCIENCE. - ISSN 1824-8039. - ELETTRONICO. - (2023). (Intervento presentato al convegno 10th International Workshop on Semiconductor Pixel Detectors for Particles and Imaging (Pixel2022) tenutosi a Santa Fe, New Mexico, USA nel 12-16 December 2022) [10.22323/1.420.0083].
Optimization of a 65 nm CMOS imaging process for monolithic CMOS sensors for high energy physics
Ferrero, Chiara;
2023
Abstract
The long term goal of the CERN Experimental Physics Department R&D on monolithic sensors is the development of sub-100nm CMOS sensors for high energy physics. The first technology selected is the TPSCo 65nm CMOS imaging technology. A first submission MLR1 included several small test chips with sensor and circuit prototypes and transistor test structures. One of the main questions to be addressed was how to optimize the sensor in the presence of significant in-pixel circuitry. In this paper this optimization is described as well as the experimental results from the MLR1 run confirming its effectiveness. A second submission investigating wafer-scale stitching has just been completed. This work has been carried out in strong synergy with the ITS3 upgrade of the ALICE experiment.File | Dimensione | Formato | |
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https://hdl.handle.net/11583/2985922