We report on the fabrication of InAs/GaAs quantum dot solar cells with high open circuit voltage by molecular beam epitaxy. `Shallow' and `deep' junction architectures were compared. The highest open circuit voltage of 0.94 V was obtained for the `shallow' junction configuration. The open circuit voltage of InAs quantum dot solar cells decreased only by ~40 mV compared to GaAs reference cells for both junction architectures indicating high quality quantum dots. The open circuit voltage of InAs/GaAs quantum dot solar cells was also found to be dependent on the size of quantum dots.

Comparison of 'shallow' and 'deep' junction architectures for MBE-grown InAs/GaAs quantum dot solar cells / Tukiainen, A.; Lyytikainen, J.; Aho, T.; Halonen, E.; Raappana, M.; Cappelluti, F.; Guina, M.. - ELETTRONICO. - 2018:(2018), pp. 2950-2952. (Intervento presentato al convegno 7th IEEE World Conference on Photovoltaic Energy Conversion, WCPEC 2018 tenutosi a usa nel 2018) [10.1109/PVSC.2018.8548180].

Comparison of 'shallow' and 'deep' junction architectures for MBE-grown InAs/GaAs quantum dot solar cells

Cappelluti F.;
2018

Abstract

We report on the fabrication of InAs/GaAs quantum dot solar cells with high open circuit voltage by molecular beam epitaxy. `Shallow' and `deep' junction architectures were compared. The highest open circuit voltage of 0.94 V was obtained for the `shallow' junction configuration. The open circuit voltage of InAs quantum dot solar cells decreased only by ~40 mV compared to GaAs reference cells for both junction architectures indicating high quality quantum dots. The open circuit voltage of InAs/GaAs quantum dot solar cells was also found to be dependent on the size of quantum dots.
2018
978-1-5386-8529-7
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11583/2738318
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