In this paper we are reporting a fabrication process for multi-section telecom lasers based on surface defined lateral gratings, which is compatible with low-cost high-throughput nano-imprint lithography. A new grating definition process is developed, which allow a better control of the cross section geometry to obtain higher coupling strengths.
Trench width dependant deeply etched surface-defined InP gratings for low-cost high speed DFB/DBR / S. Afzal; F. Schnabel; W. Scholz; J. P. Reithmaier; M. Vallone; P. Bardella; I. Montrosset. - (2011). ((Intervento presentato al convegno 37th International Conference on Micro and Nano Engineering (MNE 2011) tenutosi a Berlin nel 19 - 23 September 2011.
Titolo: | Trench width dependant deeply etched surface-defined InP gratings for low-cost high speed DFB/DBR | |
Autori: | ||
Data di pubblicazione: | 2011 | |
Abstract: | In this paper we are reporting a fabrication process for multi-section telecom lasers based on su...rface defined lateral gratings, which is compatible with low-cost high-throughput nano-imprint lithography. A new grating definition process is developed, which allow a better control of the cross section geometry to obtain higher coupling strengths. | |
Appare nelle tipologie: | 4.1 Contributo in Atti di convegno |
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http://hdl.handle.net/11583/2501454