This letter introduces a mask-based surrogate modeling framework that generalizes the feature-based paradigm for efficient microwave design exploration using a limited number of full-wave simulations. Unlike feature-based approaches, which extract scalar performance metrics, the proposed method reconstructs the complete S -parameter boundary contour within the operating band. This preserves each design's parametric signature and enables on-demand evaluation of multiple performance specifications without model retraining. The framework employs two vector-valued kernel ridge regression models to predict boundary coordinates from geometric parameters. Validation on a three-port circulator demonstrates accurate reconstruction and rapid exploration of thousands of candidate designs.
Mask Reconstruction via Kernel-Based Surrogate Modeling for Automated Circulator Design / Atlante, M., Trinchero, R., Stievano, I.S., Telescu, M., Laur, V., Tanguy, N.. - In: IEEE MICROWAVE AND WIRELESS TECHNOLOGY LETTERS. - ISSN 2771-957X. - 36:7(2026), pp. 1084-1087. [10.1109/LMWT.2026.3666201]
Mask Reconstruction via Kernel-Based Surrogate Modeling for Automated Circulator Design
Marco Atlante;Riccardo Trinchero;Igor S. Stievano;
2026
Abstract
This letter introduces a mask-based surrogate modeling framework that generalizes the feature-based paradigm for efficient microwave design exploration using a limited number of full-wave simulations. Unlike feature-based approaches, which extract scalar performance metrics, the proposed method reconstructs the complete S -parameter boundary contour within the operating band. This preserves each design's parametric signature and enables on-demand evaluation of multiple performance specifications without model retraining. The framework employs two vector-valued kernel ridge regression models to predict boundary coordinates from geometric parameters. Validation on a three-port circulator demonstrates accurate reconstruction and rapid exploration of thousands of candidate designs.| File | Dimensione | Formato | |
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Mask_Paper.pdf
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Mask_Paper_IEEE.pdf
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https://hdl.handle.net/11583/3013184
