This work describes the scalability process of a continuous-injection protocol employed to produce tin-doped indium oxide nanocrystal dispersions. Different levels of manipulation starting from the synthesis and processing also related to the tuning of the optical response (considering the peculiar combination of UV and NIR absorption with visible transparency) make these materials incredibly versatile. But one of the most attractive features concern the modulation of their charge carrier density through chemical or post-synthetic doping, as for the case of core-shell materials, expanding the properties of the core composition. In addition, the colloidal nature of such materials allows for easy solution processing which enables an extensive use in different applications within current thin films base technologies.

Scalable Production of Metal Oxide Nanoparticles for Optoelectronics Applications / Rebecchi, Luca; Martin, Irene; Albo, Ivet Maqueira; Ranjan, Priyadarshi; Gatti, Teresa; Scotognella, Francesco; Rubino, Andrea; Kriegel, Ilka. - In: CHEMISTRY-A EUROPEAN JOURNAL. - ISSN 0947-6539. - (2024). [10.1002/chem.202401711]

Scalable Production of Metal Oxide Nanoparticles for Optoelectronics Applications

Rebecchi, Luca;Martin, Irene;Albo, Ivet Maqueira;Gatti, Teresa;Scotognella, Francesco;Kriegel, Ilka
2024

Abstract

This work describes the scalability process of a continuous-injection protocol employed to produce tin-doped indium oxide nanocrystal dispersions. Different levels of manipulation starting from the synthesis and processing also related to the tuning of the optical response (considering the peculiar combination of UV and NIR absorption with visible transparency) make these materials incredibly versatile. But one of the most attractive features concern the modulation of their charge carrier density through chemical or post-synthetic doping, as for the case of core-shell materials, expanding the properties of the core composition. In addition, the colloidal nature of such materials allows for easy solution processing which enables an extensive use in different applications within current thin films base technologies.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11583/2995013