A Combinatorial Approach for the Solution Deposition of Thin Films

Optimization of thin film deposition is often the limiting step in the discovery of new materials and device development. Over the years, high-throughput combinatorial methods were developed for the deposition of thin films from the gas phase. However, very few reports focused on combinatorial thin film deposition from solution. Here, we introduce a combinatorial approach for the deposition of thin films from solution. The flow deposition setup allows for simultaneously studying the effect of two critical parameters, deposition time and deposition temperature, on a single sample. As a proof of concept, we demonstrate the solution deposition of PbS thin films, which resulted in a library of 25 deposition condition combinations on a single GaAs (100) substrate. X-ray diffraction and scanning electron microscopy combined with focused ion beam cross-sectional sample preparation confirmed the formation of high-quality PbS films and showed the morphology evolution as a function of these two deposition parameters. This method can be easily adapted for cost-effective and rapid combinatorial studies of a large variety of solution-deposited thin film materials.