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EnglishNanoporous/nanocomposite thin films with controlled morphology at nanoscale were prepared onto transparent and conductive indium tin oxide (ITO) supports by exploiting the self-assembly of a lamellar polystyrene-b-poly(methyl methacrylate) (PS-b-PMMA) block copolymer (BCP). A perpendicular orientation of PS and PMMA lamellar nanodomains was achieved by grafting a random PS-r-PMMA copolymer to the ITO supports and successive thermal annealing. Stable and reproducible nanoporous morphologies, characterized by PS lamellar nanodomains of width equal to ≈20 nm alternating to nanochannels of width equal to ≈8 nm, were obtained by irradiating the samples with an appropriate UV-C dose able to fix the relative arrangement of PS domains through activation of cross-linking reactions and selective removal of PMMA blocks. Nanoporous hybrid composites with a stable morphology were obtained either by applying the UV irradiation protocol to BCP nanocomposites characterized by selective inclusion of zinc oxide (ZnO) nanoparticles (NPs) in the PS domains (nanocomposite first/nanopores after) or by selective infiltration of cadmium selenide (CdSe) NPs in the nanochannels left free by PMMA removal through UV irradiation (nanopores first/nanocomposite after), demonstrating the strenght of the approach.
Tailored inclusion of semiconductor nanoparticles in nanoporous polystyrene-block-polymethyl methacrylate thin films / Malafronte, Anna; Emendato, Alessandro; Auriemma, Finizia; Sasso, Carmen; Laus, Michele; Murataj, Irdi; Lupi, Federico Ferrarese; De Rosa, Claudio. - In: POLYMER. - ISSN 0032-3861. - 210:(2020), p. 122983. [10.1016/j.polymer.2020.122983]
| Titolo: | Tailored inclusion of semiconductor nanoparticles in nanoporous polystyrene-block-polymethyl methacrylate thin films | |
| Autori: | ||
| Data di pubblicazione: | 2020 | |
| Rivista: | ||
| Digital Object Identifier (DOI): | http://dx.doi.org/10.1016/j.polymer.2020.122983 | |
| Appare nelle tipologie: | 1.1 Articolo in rivista |
File in questo prodotto:
| File | Descrizione | Tipologia | Licenza | |
|---|---|---|---|---|
| Polymer_2020.pdf | Articolo principale | 2. Post-print / Author's Accepted Manuscript |  | Embargo: 01/09/2022 Richiedi una copia |
| pdfresizer.com-pdf-resize.pdf | 2a Post-print versione editoriale / Version of Record | Non Pubblico - Accesso privato/ristretto | Administrator Richiedi una copia | |
| 1-s2.0-S0032386120308089-mmc1.docx | Appendix A. Supplementary data (docx) | Altro materiale allegato | Non Pubblico - Accesso privato/ristretto | Administrator Richiedi una copia |
http://hdl.handle.net/11583/2845736
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