Archivio Istituzionale della RicercaThe design of interfaces, coupled with suitable joining materials and joining technologies, is a key parameter in component manufacturing and surface pre-treatments are crucial steps for the production of robust and reliable bonds. In this work, plasma pre-treatments on SiC and Si3N4 are studied and discussed. The pre-treated joined samples have shown a higher mechanical strength than the reference value (lapped surfaces) and the increased adhesion at the ceramic/adhesive interface has led to cohesive failure of the adhesive.
A plasma pre-treatment to improve adhesion on SiC and Si3N4 ceramics / Casalegno, Valentina; Ferraris, Monica; Perero, Sergio; Suess, Manuela; Wilhelmi, Christian; Pedroni, Matteo; Vassallo, Espedito; Salvo, Milena. - In: MATERIALS LETTERS. - ISSN 0167-577X. - STAMPA. - 272:(2020), p. 127855. [10.1016/j.matlet.2020.127855]
A plasma pre-treatment to improve adhesion on SiC and Si3N4 ceramics
Casalegno, Valentina;Ferraris, Monica;Perero, Sergio;Salvo, Milena
2020
Abstract
The design of interfaces, coupled with suitable joining materials and joining technologies, is a key parameter in component manufacturing and surface pre-treatments are crucial steps for the production of robust and reliable bonds. In this work, plasma pre-treatments on SiC and Si3N4 are studied and discussed. The pre-treated joined samples have shown a higher mechanical strength than the reference value (lapped surfaces) and the increased adhesion at the ceramic/adhesive interface has led to cohesive failure of the adhesive.
| File | Dimensione | Formato | |
|---|---|---|---|
|
1-s2.0-S0167577X20305607-main.pdf
non disponibili
Descrizione: post print editoriale
Tipologia:
2a Post-print versione editoriale / Version of Record
Licenza:
Non Pubblico - Accesso privato/ristretto
Dimensione
1.85 MB
Formato
Adobe PDF
|
1.85 MB | Adobe PDF | Visualizza/Apri Richiedi una copia |
|
Casalegno et al_REVISED.pdf
Open Access dal 21/04/2022
Descrizione: post print non editoriale
Tipologia:
2. Post-print / Author's Accepted Manuscript
Licenza:
Creative commons
Dimensione
627.26 kB
Formato
Adobe PDF
|
627.26 kB | Adobe PDF | Visualizza/Apri |
Pubblicazioni consigliate
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
https://hdl.handle.net/11583/2817349