To withstand oxidation at a temperature≥850 °C, an optimized Ti1−xAlxN coating was grown via reactive High Power Impulse Magnetron Sputtering (HiPIMS) technology on three identical Ti0.48Al0.48Cr0.02Nb0.02 billets. Different substrate surface pre-treatments were designed to increase performance: i) mechanical polishing, ii) mechanical polishing combined with a strong plasma etching, and iii) mechanical polishing coupled to both a weak plasma etching and a Ti1−yAly metallic interlayer deposition. Then, all the specimens were cyclically heat treated up to 200 cycles at 950 °C, using a Burner Rig (BR) facility. The chosen Ti1−xAlxN/substrate interface architecture considerably influenced average compressive residual stress (Sres) and adhesion of just deposited films. Moreover, it was possible to identify a clear relationship between Sres behavior and each coating comportment after BR tests. It became clear that the weak plasma etching/ Ti1−yAly interlayer match helped improving the system stability (i.e. very low average residual stress thermal relaxation) thus guarantying high temperature oxidation resistance.
Ti1−xAlxN coatings by Reactive High Power Impulse Magnetron Sputtering: film/substrate interface effect on residual stress and high temperature oxidation / Deambrosis, S. M.; Montagner, F.; Zin, V.; Fabrizio, M.; Badini, C.; Padovano, E.; Sebastiani, M.; Bemporad, E.; Brunelli, K.; Miorin, E.. - In: SURFACE & COATINGS TECHNOLOGY. - ISSN 0257-8972. - 354(2018), pp. 56-65.
|Titolo:||Ti1−xAlxN coatings by Reactive High Power Impulse Magnetron Sputtering: film/substrate interface effect on residual stress and high temperature oxidation|
|Data di pubblicazione:||2018|
|Digital Object Identifier (DOI):||http://dx.doi.org/10.1016/j.surfcoat.2018.09.004|
|Appare nelle tipologie:||1.1 Articolo in rivista|