Optical resonators are fundamental building-blocks for the development of Si-photonics-integrated circuits, as tunable on-chip optical filters. In addition to the specific spectral shape, which may vary according to a particular application, extremely low losses from these devices are a crucial requirement. In the current state-of-the-art devices, most low-loss filters have only been demonstrated by exploiting ad hoc lithographic and etching techniques, which are not compatible with the standard CMOS (complementary metal-oxide semiconductor) process-flow available at Si-photonic foundries. In this paper, we describe the design and optimization of optical micro-resonators, based on Si-waveguides with a height lower than the standard ones (i.e., less than 220 nm), prepared on SOI (silicon on insulator) platform, which allow the realization of high-performance optical filters with an insertion loss lower than 1 dB, using only previously validated lithographic etch-depths
Low-loss micro-resonator filters fabricated in silicon by CMOS-compatible lithographic techniques: Design and characterization / Marchetti, Riccardo; Vitali, Valerio; Lacava, Cosimo; Cristiani, Ilaria; Giuliani, Guido; Muffato, Viviane; Fournier, Maryse; Abrate, Silvio; Gaudino, Roberto; Temporiti, Enrico; Carroll, Lee; Minzioni, Paolo. - In: APPLIED SCIENCES. - ISSN 2076-3417. - ELETTRONICO. - 7:2(2017).
|Titolo:||Low-loss micro-resonator filters fabricated in silicon by CMOS-compatible lithographic techniques: Design and characterization|
|Data di pubblicazione:||2017|
|Digital Object Identifier (DOI):||http://dx.doi.org/10.3390/app7020174|
|Appare nelle tipologie:||1.1 Articolo in rivista|