Thick dielectric films produced by electrophoretic deposition

Electrophoretic deposition (EPD) from colloidal suspensions was utilized for the preparation of lead zirconate titanate films (PZT) on PZT based substrates. The present process is developed as a convenient forming process for the development of devices based on thick ceramic films. The deposition parameters - using EPD - such as colloidal parameters, deposition voltage and deposition time and the post process parameters, such as drying velocity and sintering will be controlled. Conductive materials are customarily used as deposition substrates, but the possibility of depositing on semiconductors (SC) has recently been demonstrated in this laboratory [1]. This work wants to continue the research started by Baldisserri et al. that puts emphasis on the analysis of current transients during constant-voltage deposition as a diagnostic tool for the assessment of some crucial features of the EPD process [2,3]; the correlations between the above parameters and final microstructure, by checking the salient features like the film adhesion, compaction and functionality, will be investigated. References [1] C. Baldisserri, D. Gardini, C. Galassi, Sensors & Actuators A 174 (2012) 123. [2] C. Baldisserri, D. Gardini, C. Galassi, J. Colloid Interface Sci., 347 (2010) 102. [3] H. Farnoush, J.A. Mohandesi, D. H. Fatmehsari, Ceram. Int., 38 (2012) 6753.