An electrochemical and photoelectrochemical study of pure and iron implanted copper in alkaline solution has been performed by means of: - photopotential measurements at different electrodic voltages; - voltammetric curves tracing, in order to reveale the effects induced by light on the current; - polarization resistance (Rp) measurements, in order to determine the corrosion rate of the electrodes. The reduction mechanism on pure copper are discussed. Iron, entering the surface oxide lattice in iron implanted copper, stabilizes the passive film in alkaline solution.
Electrochemical and photoelectrochemical study of pure and iron implanted copper in alkaline medium / ANGELINI E.; M. BASSOLI; P. L. BONORA; M. MAJA; P. MAZZOLDI. - In: MATERIALS CHEMISTRY. - ISSN 0390-6035. - STAMPA. - 6:4-5(1981), pp. 343-358.
|Titolo:||Electrochemical and photoelectrochemical study of pure and iron implanted copper in alkaline medium|
|Data di pubblicazione:||1981|
|Digital Object Identifier (DOI):||http://dx.doi.org/10.1016/0390-6035(81)90059-6|
|Appare nelle tipologie:||1.1 Articolo in rivista|
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