Archivio Istituzionale della Ricercaa-Si1xNx:H thin films grown by PECVD in a wide compositional range were characterized by spectroscopic ellipsometry and Mach–Zehnder interferometry. Taking advantage from their optical properties, the alloys were fruitfully applied for stratified structures such as distributed Bragg reflectors, conventional and double resonance optical microcavities.
Amorphous Silicon Nitride: a suitable alloy for optical multilayered structures / Ricciardi, Carlo; V., Ballarini; M., Galli; M., Liscidini; L. C., Andreani; M., Losurdo; G., Bruno; S., Lettieri; F., Gesuele; P., Maddalena; Giorgis, Fabrizio. - In: JOURNAL OF NON-CRYSTALLINE SOLIDS. - ISSN 0022-3093. - 352:(2006), pp. 1294-1297.
Amorphous Silicon Nitride: a suitable alloy for optical multilayered structures
RICCIARDI, Carlo;GIORGIS, FABRIZIO
2006
Abstract
a-Si1xNx:H thin films grown by PECVD in a wide compositional range were characterized by spectroscopic ellipsometry and Mach–Zehnder interferometry. Taking advantage from their optical properties, the alloys were fruitfully applied for stratified structures such as distributed Bragg reflectors, conventional and double resonance optical microcavities.
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https://hdl.handle.net/11583/1465446
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