A NEW APPARATUS FOR DEEP PATTERNING OF BEAM SENSITIVE TARGETS BY MEANS OF HIGH-ENERGY ION BEAM

The paper reports on a high precision equipment designed to modify over 3-dimensions (3D) by means of highenergy heavy ions the local properties of thin and thick films. A target-moving system aimed at creating patterns across the volume is driven by an x–y writing protocol that allows one to modify beam sensitive samples over micrometer-size regions of whatever shape. The moving system has a mechanical resolution of 15 nm. The issue of the local fluence measurement has been particularly addressed. The setup has been checked by means of different geometries patterned on beam sensitive sheets as well as on superconducting materials. In the last case the 3D modification consists of amorphous nanostructures. The nanostructures create zones with different dissipative properties with respect to the virgin regions. The main analysis method consists of magneto-optical imaging that provides local information on the electrodynamics of the modified zones. Features typical of non-linear current flow hint at which pattern geometry is more functional to applications in the framework of confined nanostructuring of superconducting films.