METHODS FOR OBTAINING. HOLLOW NANO-STRUCTURES

Methods are provided for obtaining hollow nano-structures which include the steps of providing a Suspended film starting layer on a Support Substrate, depositing on the starting layer a sacrificial layer, performing, in progressive sequence, a com plete erosion phase of said Support Substrate and starting layer and performing an at least partial erosion phase of the sacri ficial layer previously deposited on the starting layer so as to obtain holes passing through the starting layer and passing or non passing through the sacrificial layer, depositing, on the side of the support substrate opposite to that where the start ing layer is put, at least one covering layer arranged to inter nally cover the holes created by the progressive erosion. Hol low nano-structures formed by Such methods are also provided.