Nanographene patterns from focused ion beam-induced deposition structural characterization of graphene materials by XPS and raman scattering

The integration of carbon nanomaterials, having peculiar determined specifications and properties, presents fabrication and control challenges. The current attention on graphene research evidences the necessity to completely integrate gra phene in the standard semiconductor planar technologies as the route for future graphene-based nano-electronics. The chapter will introduce our work in Rius et al. (2012) as an approach inspired on the planar technology point of view and strategies. Merging the carbon nanomaterial preparation and lithography in a single processing step by means of focused ion beam induced deposition of carbon (FIBID-C), our route is a new concept of a robust and flex ible nanofabrication methodology for graphene. The strong points of this approach are (i) the uniqueness of the approach, toward transfer-free graphene-like patterns on insulators and (ii) a convenient platform for studying growth process of solid precursor-derived graphene-like materials. The nanographene products will be deeply investigated and characterized by means of two fundamental structural nondestructive techniques: X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy, using multi wavelength sources. The chapter will include a complete set of reference spectra of graphene, with their accurate discussion, high lighting the correlation of these two different, but comple mentary, analysis techniques (Yang et al. 2009).