The progressive down-scaling has been the driving force behind the integrated circuit (IC) industry for several decades, continuously delivering higher component densities and greater chip functionality, while reducing the cost per function from one CMOS technology generation to the next. Moore’s law boosts IC industry profits by constantly releasing high-quality and inexpensive electronic applications into the market using new technologies. From the 1 m gate lengths of the eighties to the 35 nm gate lengths of contemporary 22 nm technology, the industry successfully achieved its scaling goals, not only miniaturizing devices but also improving device performance.
Developement of simulation tools for the analysis of variability in advanced semiconductor electron devices / Tisseur, Riccardo. - (2013). [10.6092/polito/porto/2556945]
Developement of simulation tools for the analysis of variability in advanced semiconductor electron devices
TISSEUR, RICCARDO
2013
Abstract
The progressive down-scaling has been the driving force behind the integrated circuit (IC) industry for several decades, continuously delivering higher component densities and greater chip functionality, while reducing the cost per function from one CMOS technology generation to the next. Moore’s law boosts IC industry profits by constantly releasing high-quality and inexpensive electronic applications into the market using new technologies. From the 1 m gate lengths of the eighties to the 35 nm gate lengths of contemporary 22 nm technology, the industry successfully achieved its scaling goals, not only miniaturizing devices but also improving device performance.File | Dimensione | Formato | |
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RiccardoTisseur_PhDThesis.pdf
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https://hdl.handle.net/11583/2556945
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