Sfoglia per Rivista VACUUM
An ion beam spot size monitor based on a nano-machined Si photodiode probed by means of the ion beam induced charge technique
2022 Andrini, G; Hernandez, En; Provatas, G; Brajkovic, M; Crnjac, A; Tchernij, Sd; Forneris, J; Rigato, V; Campostrini, M; Siketic, Z; Jaksic, M; Vittone, E
“Preparation of vanadium oxides thin films by ion beam sputtering and oxidation annealing”
2004 Wang, Shuangbao; X. J., Yi
“The formation of Ti-silicides by a metal vapour vacuum are ion source implantation and annealing process”
2000 Wang, Shuangbao; H., Liang; P. R., Zhu
Citazione | Data di pubblicazione | Autori | File |
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An ion beam spot size monitor based on a nano-machined Si photodiode probed by means of the ion beam induced charge technique / Andrini, G; Hernandez, En; Provatas, G; Brajkovic, M; Crnjac, A; Tchernij, Sd; Forneris, J; Rigato, V; Campostrini, M; Siketic, Z; Jaksic, M; Vittone, E. - In: VACUUM. - ISSN 0042-207X. - STAMPA. - 205:(2022), p. 111392. [10.1016/j.vacuum.2022.111392] | 1-gen-2022 | Andrini, G + | Andrini-AnIon.pdf |
“Preparation of vanadium oxides thin films by ion beam sputtering and oxidation annealing” / Wang, Shuangbao; X. J., Yi. - In: VACUUM. - ISSN 0042-207X. - 75:(2004), pp. 85-89. | 1-gen-2004 | WANG, SHUANGBAO + | - |
“The formation of Ti-silicides by a metal vapour vacuum are ion source implantation and annealing process” / Wang, Shuangbao; H., Liang; P. R., Zhu. - In: VACUUM. - ISSN 0042-207X. - 59:(2000), pp. 919-921. | 1-gen-2000 | WANG, SHUANGBAO + | - |
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