Our study advances the development of new ternary silicate glasses for use as a designed cladding for semiconductor core optical fibers using molten core draw process. In order to fabricate high‐quality hybrid fibers (homogeneous core shape, low amount of bubbles, low internal stress, no cracking), oxide glasses are the best choice as cladding materials. These glasses should be engineered with tailored thermal properties (coefficient of thermal expansion (CTE) and drawing temperature) so they match those of the semiconductor. Glasses in the system (50SiO2‐(20 − x)Na2O‐(25 + x)B2O3‐5MO) with x = 0 and 10 and MO = ZnO, TiO2, GeO2, Ga2O3, and Al2O3 and in the system 50SiO2‐10Na2O‐(40 − y)B2O3‐ yTiO2 with y = 0, 1.25, 2.5, and 5 were investigated. Their thermal properties were measured and discussed with regard to the glass structure analyzed using FTIR spectroscopy. Due to their rigid network, which leads to beneficial thermal properties including low CTE (~5 ppm K−1), the Ge‐containing glass with x = 10 is a promising cladding candidate when preparing a Ge core fiber and the Ga or Zn‐ containing glasses when preparing an InAs core.

Ternary borosilicates as potential cladding glasses for semiconductor core optical fibers / Dmitrieva, Iuliia; Lopez-Iscoa, Pablo; Milanese, Daniel; Petit, Laeticia. - In: INTERNATIONAL JOURNAL OF APPLIED GLASS SCIENCE. - ISSN 2041-1286. - ELETTRONICO. - 10:2(2019), pp. 151-156. [10.1111/ijag.12874]

Ternary borosilicates as potential cladding glasses for semiconductor core optical fibers

Lopez-Iscoa, Pablo;Milanese, Daniel;
2019

Abstract

Our study advances the development of new ternary silicate glasses for use as a designed cladding for semiconductor core optical fibers using molten core draw process. In order to fabricate high‐quality hybrid fibers (homogeneous core shape, low amount of bubbles, low internal stress, no cracking), oxide glasses are the best choice as cladding materials. These glasses should be engineered with tailored thermal properties (coefficient of thermal expansion (CTE) and drawing temperature) so they match those of the semiconductor. Glasses in the system (50SiO2‐(20 − x)Na2O‐(25 + x)B2O3‐5MO) with x = 0 and 10 and MO = ZnO, TiO2, GeO2, Ga2O3, and Al2O3 and in the system 50SiO2‐10Na2O‐(40 − y)B2O3‐ yTiO2 with y = 0, 1.25, 2.5, and 5 were investigated. Their thermal properties were measured and discussed with regard to the glass structure analyzed using FTIR spectroscopy. Due to their rigid network, which leads to beneficial thermal properties including low CTE (~5 ppm K−1), the Ge‐containing glass with x = 10 is a promising cladding candidate when preparing a Ge core fiber and the Ga or Zn‐ containing glasses when preparing an InAs core.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11583/2728203
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