This paper presents a comprehensive evaluation of GaN HEMT technology development on SiC substrates, relying on an electro-thermal model validated against DC, pulsed DC and S-parameter measurements. The measured devices are backside mounted, but the layout is also conceived for flip-chip mounting. Based on accurate estimation of the device thermal resistance, the model enables to explore and assess the device performances in both backside and flip-chip configurations; results are shown both for conventional ceramic AIN flip-chip mountings, and for advanced (diamond) heatsinks. © 2006 IEEE.

Evaluation of GaN HEMT technology development through nonlinear characterization / Angelini, A.; Camarchia, V.; Cappelluti, F.; Donati Guerrieri, S.; Pirola, M.; Bonani, F.; Serino, A.; Ghione, G.. - STAMPA. - 2006:(2006), pp. 105-108. (Intervento presentato al convegno 18th International Symposium on Power Semiconductor Devices and ICs, ISPSD'06 tenutosi a Naples, Italy nel 04-08 June 2006) [10.1109/ISPSD.2006.1666082].

Evaluation of GaN HEMT technology development through nonlinear characterization

Angelini A.;Camarchia V.;Cappelluti F.;Donati Guerrieri S.;Pirola M.;Bonani F.;Ghione G.
2006

Abstract

This paper presents a comprehensive evaluation of GaN HEMT technology development on SiC substrates, relying on an electro-thermal model validated against DC, pulsed DC and S-parameter measurements. The measured devices are backside mounted, but the layout is also conceived for flip-chip mounting. Based on accurate estimation of the device thermal resistance, the model enables to explore and assess the device performances in both backside and flip-chip configurations; results are shown both for conventional ceramic AIN flip-chip mountings, and for advanced (diamond) heatsinks. © 2006 IEEE.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11583/2981053